RORZE IAS Inc. Overview
RORZE IAS is a specialist Japanese maker of automation equipment for ultra-trace metal analysis by inductively coupled plasma mass spectrometry (ICP-MS). It works in a narrow but critical part of semiconductor yield management: finding metallic contamination on and in silicon wafers, in process chemicals and in gases. Its flagship Expert VPD platform sits inside production fabs. It connects to fab automation through SEMI E84 load ports and CIM-host messaging and runs around the clock, with more than 100 units installed worldwide. Newer products extend the company into laser ablation ICP-MS for direct analysis of wafers, including SiC and GaN substrates that VPD cannot decompose, and into online monitoring of chemicals and gases. More than 70% of sales are overseas, and the company holds more than 60 patents. Since March 2023 it has been part of the RORZE group, a global leader in wafer-handling robots and EFEMs. RORZE adds manufacturing scale and overseas service reach to IAS's analytical know-how.
What the company does
RORZE IAS designs, manufactures and sells three groups of products:
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ICP-OES and ICP-MS parts and peripheral equipment, such as automated standard-addition modules, autosamplers with automatic dilution, and gas-introduction devices.
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Pretreatment equipment for metal analysis, mainly fully automated VPD systems for silicon wafers and laser ablation systems for direct solid sampling.
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Consulting on analytical methods and equipment handling.
The company's main official description, from its 2025 municipal company profile and its website, is that it is an expert in ultra-trace metallic impurity analysis using ICP-MS. It focuses on fully automating analysis from sample pretreatment onward. This avoids contamination from the surrounding environment and lowers operators' exposure to chemical vapors.
Business model and revenue model
The company sells capital equipment. Most revenue comes from system sales: Expert VPD units, laser ablation systems, and online chemical-monitoring systems. Each system is usually paired with an ICP-MS instrument that the customer buys from a third-party maker such as Agilent Technologies, PerkinElmer or Thermo Fisher Scientific. Recurring revenue comes from:
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ICP-OES/ICP-MS consumable parts sold through the company's parts catalogue
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installation, application training and after-sales application support
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method and equipment consulting
The company does not disclose how revenue splits between products, parts and services. There is no subscription or licensing model.
Value-chain position
RORZE IAS sits between the ICP-MS makers and the semiconductor fab. The ICP-MS maker supplies the detector. RORZE IAS supplies the wafer handling, chemistry, sample preparation, calibration and automation software that turn a laboratory instrument into an in-line fab metrology tool. Its software communicates with the instrument makers' control software. For example, the Expert_PS software works with PerkinElmer's Syngistix, and the company has co-authored application notes with Agilent on its 8900 ICP-QQQ. This makes the company a complement to the large ICP-MS makers rather than a competitor.
Customers and end-markets
The company states that it has delivered systems to most of the major semiconductor device makers, wafer makers and semiconductor equipment makers, and that more than 70% of sales come from overseas. Its end-markets are:
Front-end semiconductor device fabs: (logic, memory, foundry), which monitor wafer-surface and film contamination
- Silicon wafer makers, for incoming and outgoing wafer cleanliness checks
Compound and power-semiconductor substrate makers: (SiC, GaN), served by the laser ablation route
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Process chemical and gas suppliers and fab chemical-distribution systems, served by the CSI, ASAS II, ASDM and GED products
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Environmental and general analytical laboratories, which use the GED for airborne metal particulates
Independent characterization
RORZE IAS is a niche, technology-led "global niche top" supplier. The Tokyo Metropolitan Government twice selected it for its Global Niche Top grant program, in 2016 and 2019. Its competitive moat rests on three things:
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integration know-how across wafer robotics, HF-vapor chemistry, droplet scanning and ICP-MS software
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a large installed base in production fabs, which makes it costly for customers to switch
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a patent estate of more than 60 families
Its main limit is scale. With about 70 employees and annual sales of about JPY 3.9 billion, it relies on its parent for global manufacturing and field-service capacity. That gap was the stated reason for the 2023 combination.
Strategy
Stated strategy
The company presents its management style as being built on R&D and product support, so that it can create "only-one" products for niche markets. It stresses three themes:
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Full automation from pretreatment onward, to remove environmental contamination and protect operators.
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Moving beyond the silicon-wafer surface: depth, bevel, nanoparticles, wide-bandgap substrates, chemicals and gases.
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Global reach, with more than 70% of sales overseas and active hiring of engineers who want to work abroad.
Group strategic rationale (RORZE disclosure, 6 January 2023)
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Both companies put technology-driven product development first and share a similar corporate culture.
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As chips shrink, preventing yield loss from contamination matters more. The two companies plan to combine their technologies and develop next-generation products.
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RORZE's global product-supply system will support IAS products, improving quality reliability and customer satisfaction and speeding up growth.
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RORZE said the addition of IAS's "technology related to ultra trace metal analysis" would speed development of high-value-added, one-of-a-kind products.
Initiatives in the last 24 months
| Initiative | Date | Description |
|---|---|---|
| Rebranding to RORZE IAS | 1 Mar 2025 | Name change aligns the subsidiary with the group brand |
| European channel integration | Mar 2025 | IAS EUROPE S.A.R.L. renamed RORZE ENGINEERING France Sarl |
| Headcount expansion | 2025–2026 | Employees rose to 70; continuous hiring of application and support engineers backed by RORZE's overseas bases |
| Laser ablation and nanoparticle analysis | 2023 onward | Commercialization of LA-GED-MSAG-ICP-MS for SiC/GaN wafers and nanoparticle detection on 300 mm wafers |
| Instrument-maker co-marketing | Ongoing | Joint application notes and webcasts with Agilent and PerkinElmer |
Rebranding to RORZE IAS: Date: 1 Mar 2025; Description: Name change aligns the subsidiary with the group brand
European channel integration: Date: Mar 2025; Description: IAS EUROPE S.A.R.L. renamed RORZE ENGINEERING France Sarl
Laser ablation and nanoparticle analysis: Date: 2023 onward; Description: Commercialization of LA-GED-MSAG-ICP-MS for SiC/GaN wafers and nanoparticle detection on 300 mm wafers
Instrument-maker co-marketing: Date: Ongoing; Description: Joint application notes and webcasts with Agilent and PerkinElmer
Medium-term targets
| Metric | Original guidance (Apr 2026) | Revised guidance (Oct 2026) |
|---|---|---|
| Revenue (JPY M) | 159,021 | 180,007 |
| Operating income (JPY M) | 38,112 | 53,078 |
| Ordinary income (JPY M) | 38,241 | 54,889 |
| Net income (JPY M) | 27,809 | 37,779 |
| Dividend per share (JPY) | 20 | 28 |
RORZE IAS does not publish financial targets. The parent's guidance for the FY ending February 2027, revised on 8 October 2026, is:
Revenue (JPY M): Original guidance (Apr 2026): 159021; Revised guidance (Oct 2026): 180007
Operating income (JPY M): Original guidance (Apr 2026): 38112; Revised guidance (Oct 2026): 53078
Ordinary income (JPY M): Original guidance (Apr 2026): 38241; Revised guidance (Oct 2026): 54889
Net income (JPY M): Original guidance (Apr 2026): 27809; Revised guidance (Oct 2026): 37779
Dividend per share (JPY): Original guidance (Apr 2026): 20; Revised guidance (Oct 2026): 28
Products & Services
Expert™ fully automated VPD system (Expert_PS, Expert FAB, Expert LAB)
Description: Pretreatment system for ICP-MS analysis of metallic impurities on silicon wafers and in films grown on them. It is installed inside fabs and built into production lines that run 24 hours a day, 365 days a year. More than 100 units are in operation at semiconductor plants worldwide.
Process: The wafer is exposed to HF vapor in a VPD chamber, which decomposes native or thermal SiO2 (and films such as SiN). A scan droplet, typically 3% HF / 4% H2O2, or aqua regia for noble metals such as Ru, Au, Pt, Ag and Pd, then sweeps the surface to collect the metals. The droplet goes directly to the ICP-MS.
Standard modules (Expert_PS): load ports, wafer transfer robot, aligner, VPD chamber, scan stage, autosampler, drying chamber, and the Automated Standard Addition System (ASAS).
Options: bulk etching module, equilibrium chamber, edge (bevel) scan, aqua-regia scan for noble metals, and depth-profile analysis.
Fab integration: handles 300 mm FOUPs and FOSBs (up to 25 wafers each) and communicates with overhead hoist transport by SEMI E84. Results are converted from pg/mL to atoms/cm² using the scanned area and sent to the CIM host.
Performance: with a high-sensitivity triple-quadrupole ICP-MS, typical VPD-ICP-MS detection limits are 1E+05 to 1E+07 atoms/cm². VPD-TXRF typically reaches 1E+08 to 1E+10 atoms/cm².
Quality control: built-in QC checks run preset recovery actions when a check fails.
Validated ICP-MS pairings: Agilent 8900 ICP-QQQ; PerkinElmer NexION 5000 multi-quadrupole ICP-MS. The software interfaces with PerkinElmer's Syngistix.
Target customers: device fabs and wafer makers.
Pricing: not publicly disclosed.
Expert_LA and LAGM™ (laser ablation – GED – MSAG system)
Description: Laser ablation ICP-MS system for direct analysis of solid wafers. A femtosecond laser vaporizes material from a 300 mm wafer, so metal contamination can be measured at specific surface spots, with depth, and at the wafer bevel.
Architecture: LA-GED-MSAG. Laser ablation is combined with the gas exchange device (GED) and metal standard aerosol generation (MSAG), which supplies gas-phase calibration standards. The company says this solves the quantitation problems and small closed-cell limits of conventional LA-ICP-MS.
Applications: - wide-bandgap substrates (SiC, GaN), which HF vapor cannot decompose so VPD does not work
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local contamination at the bevel
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depth profiling
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direct nanoparticle analysis on 300 mm wafers, presented by the founder at SEMI
Validated ICP-MS pairing: Agilent 8900 ICP-QQQ (2023 application note on SiC and GaN).
Target customers: power-semiconductor and compound-semiconductor substrate and device makers; advanced-node fabs that need bevel and particle analysis.
CSI online monitoring system
Description: Online system that samples chemicals at remote points along fab chemical-distribution lines. It measures metallic impurities automatically at ppt and sub-ppt levels, continuously, 24 hours a day.
Target customers: fab facilities and chemical-supply engineering; chemical makers.
ASAS II online automatic standard addition system
Description: Adds calibration standards or internal standards online into the sample stream entering the ICP-MS nebulizer. It supports both external calibration and the standard-addition method, which corrects for matrix effects in different chemicals and organic solvents.
Key features: optical flow sensors measure the actual self-aspiration rate, so the right amount of standard is added; standards are typically added at about 1 µL/min (internal standard) and 0.5–10 µL/min (multi-element). The unit is small enough to sit between the autosampler and the ICP-MS.
Integration: built into the Expert VPD and chemical-analysis systems. Used by Agilent to analyze IPA undiluted (2022 application note).
ASDM™ autosampler with automatic dilution
Description: Autosampler that automatically dilutes ultra-high-purity chemicals 2× to 1,000× before ICP-MS measurement. Designed to work with ASAS II for fully automated chemical analysis.
Target customers: chemical QC laboratories, fab analytical laboratories.
GED (gas exchange device)
Description: Introduces metal particulates suspended in gas directly into the ICP-MS. The company says it is about 1,000 times more sensitive than conventional collection methods. Used for specialty-gas purity checks in semiconductor work and in environmental analysis.
ICP-OES / ICP-MS parts
Description: Spare parts and components for ICP instruments, supporting the installed base and the wider analytical-laboratory market.
Services
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Consulting on analytical methods and equipment handling
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Installation, application training, application-note development and post-sale application support, provided by a dedicated laboratory team (the lab team that support engineers join had seven members in 2026)
Financial Narrative
RORZE IAS has been unlisted throughout its history. Its only published audited-basis financial statements are the three single-entity years disclosed by RORZE CORPORATION in the 6 January 2023 acquisition notice (Japanese GAAP, fiscal years ending November). Since March 2023, results are consolidated into RORZE and not reported separately. Figures for FY2022 to FY2025 are not publicly disclosed, apart from the approximate annual sales in the Hino City profiles.
Income statement
Revenue grew at a compound annual rate of 27.1% from FY2019 to FY2021. Gross profit, EBITDA, pre-tax income and EPS are not publicly disclosed. With 1,784 shares outstanding and a dividend of JPY 2,500 per share, total dividends were about JPY 4.5 million a year. That is a payout ratio below 5% of FY2020 earnings, showing that profits were kept in the business.
Balance sheet
Cash, debt, goodwill, intangibles and working-capital detail are not publicly disclosed. Liabilities rose from JPY 915 million to JPY 1,841 million between FY2019 and FY2021. That is consistent with more customer advances and payables as order volume grew, but the split is not public.
Later revenue indications
Both columns come from Hino City company profiles. The company states the patent counts as "more than" the figures shown.
Commentary
Trend. Revenue more than doubled, from JPY 1.79 billion in FY2019 to about JPY 3.9 billion in the FY2025 profile. That implies a compound growth rate of roughly 14% a year over six years, with the biggest step in FY2021 (+54.7%). That year matches the 2021 semiconductor capex upcycle, when fabs added capacity worldwide and stepped up contamination control at advanced nodes.
Operating leverage. Operating margin rose from 9.0% to 20.4% in FY2021 on 55% more sales. This shows a high-fixed-cost engineering model: a small team of about 40 people serving a global installed base. Ordinary income exceeded operating income in FY2020 and FY2021 (by JPY 11 million and JPY 79 million). Given more than 70% overseas sales, this is consistent with foreign-exchange gains and non-operating income such as public R&D grants, though the breakdown is not public.
Capital structure. The equity ratio stayed at 41–43% and the company paid almost no dividends, so it funded growth internally. The company's 2026 statement that it has been profitable every year since founding fits the three disclosed years.
Post-acquisition. Since March 2023, RORZE IAS's results sit inside RORZE's semiconductor & FPD segment. The parent's consolidated revenue rose from JPY 124.4 billion (FY ended Feb 2025) to JPY 128.8 billion (FY ended Feb 2026), with guidance of JPY 180.0 billion for the FY ending Feb 2027. RORZE IAS is under 3% of group revenue, so it does not move the parent's figures.
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View Subscription PlansFinancial Detail
Product Families
| Product family | Contents | Main application |
|---|---|---|
Wafer pretreatment and analysis | Expert VPD (PS, FAB and LAB models), Expert_LA, LAGM | Metal contamination on and in Si, SiC and GaN wafers |
Liquid chemical analysis | CSI online monitoring system, ASAS II, ASDM | Sub-ppt monitoring of process chemicals and ultrapure water |
Gas analysis | GED (gas exchange device) | Metal particulates in specialty gases and ambient air |
Parts and consumables | ICP-OES/ICP-MS parts | Installed-base support |
Services | Method and handling consulting, installation, training | All customers |
Revenue by Segment
| Metric | FY2025 | FY2026 | FY2027E |
|---|---|---|---|
RORZE consolidated revenue (JPY Mn) | 124,406 | 128,794 | 180,007 |
RORZE consolidated operating income (JPY Mn) | 32,024 | 31,154 | 53,078 |
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View Subscription PlansIncome Statement and Per-Share Data
| Metric | FY2019 | FY2020 | FY2021 |
|---|---|---|---|
Revenue (JPY Mn) | 1,787 | 1,868 | 2,889 |
Operating income (JPY Mn) | 160 | 185 | 589 |
Ordinary income (JPY Mn) | 139 | 196 | 668 |
Net income (JPY Mn) | 104 | 148 | 458 |
Dividend per share (JPY) | 2,500 | 2,500 | 2,500 |
Revenue growth (%) | — | 4.5 | 54.7 |
Operating margin (%) | 9.0 | 9.9 | 20.4 |
Ordinary margin (%) | 7.8 | 10.5 | 23.1 |
Net margin (%) | 5.8 | 7.9 | 15.9 |
Balance Sheet and Margin Analysis (%)
| Metric | FY2019 | FY2020 | FY2021 |
|---|---|---|---|
Total assets (JPY Mn) | 1,606 | 1,936 | 3,129 |
Net assets (JPY Mn) | 691 | 834 | 1,288 |
Equity ratio (%) | 43.0 | 43.1 | 41.2 |
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View Subscription PlansReturns & Leverage Ratios (%) and Financial Ratios (x)
| Metric | FY2019 | FY2020 | FY2021 |
|---|---|---|---|
ROE on year-end equity (%) | 15.1 | 17.7 | 35.6 |
ROE on average equity (%) | — | 19.4 | 43.2 |
ROA on year-end assets (%) | 6.5 | 7.6 | 14.6 |
Asset turnover (x) | 1.11 | 0.96 | 0.92 |
Key Financials
| Metric | Pre-rename profile | FY2025 profile |
|---|---|---|
Annual sales (JPY Mn, approximate) | 3,300 | 3,900 |
Employees | 44 | 70 |
Patents held (domestic and overseas) | 50 | 60 |
Region Overview
| Region | Share of sales | Basis |
|---|---|---|
Japan | Less than 30% | Company statement that overseas sales exceed 70% |
Overseas (all regions combined) | More than 70% | Company statement (Hino City profiles, pre-rename and FY2025 editions) |
Valuation Snapshot
| Metric | Value |
|---|---|
Share price | JPY 4,460 (close, 16 October 2026) |
Market capitalization | About JPY 735–793 billion (2026 quotations) |
Trailing P/E | About 26–28x (2026 quotations) |
Dividend per share, FY ended Feb 2026 | JPY 17 |
Dividend per share, FY ending Feb 2027 (revised guidance) | JPY 28 (+64.7%) |
Payout ratio, FY ending Feb 2027 (original guidance) | 12.5% |
Equity ratio (H1 of FY ending Feb 2027) | 67.2% |
Credit ratings | No Moody's, S&P or Fitch ratings are published |
Metric | FY2026 |
RORZE dividend per share (JPY) | 17 |
RORZE net income (JPY Mn) | 19,048 |
Implied 100% equity value (JPY Mn) | 5,700 |
Equity value / FY2021 sales (x) | 2.0 |
Equity value / FY2021 net income (x) | 12.4 |
Equity value / FY2021 net assets (x) | 4.4 |
Analyst Conclusions
Guidance and expectations
RORZE IAS gives no standalone guidance. Its parent expects record results for the FY ending February 2027: sales of JPY 180,007 million (+39.8% year on year), operating income of JPY 53,078 million (+70.4%), and net income of JPY 37,779 million (+98.3%). Semiconductor-related equipment accounts for 98% of the upward revision. That reflects strong investment in front-end capacity, which historically pulls through demand for in-fab contamination monitoring.
Bull case
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Capex upcycle leverage. RORZE IAS's FY2021 results showed that a 55% sales jump more than doubled operating margin to 20.4%. A capex cycle comparable to the one now raising the parent's guidance by 13% would produce similar operating leverage.
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Wide-bandgap and nanoparticle analysis. LA-GED-MSAG gives RORZE IAS a technology lead in SiC and GaN contamination control, where VPD cannot be used and few competitors have equivalent production tools.
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Group distribution. RORZE subsidiaries in eight countries let the company scale service capacity well beyond what a 70-person firm could do alone.
Bear case
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Competition. PVA TePla's inline WSMS Integra HT promises twice the throughput of standard VPD, which could win new fab lines on cost of ownership.
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Cyclicality and China exposure. More than 70% of sales are overseas, and parent demand depends on Taiwan, the US and China. A capex pause or tighter export controls would hit a small, single-site supplier hard.
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Low visibility. With no standalone disclosure since 2023 and a group-level IP dispute just settled, outsiders cannot track performance closely.
Key catalysts and monitorables (next 12 months)
| Timing | Catalyst | What to watch |
|---|---|---|
| Jan 2027 | RORZE Q3 results (FY ending Feb 2027) | Progress against the JPY 180.0 billion sales guidance; commentary on analytical equipment |
| Apr 2027 | RORZE full-year results and FY ending Feb 2028 guidance | Growth outlook; any segment detail on analytical equipment |
| May 2027 | RORZE annual securities report | Subsidiary data; goodwill on the IAS acquisition |
| 2,027 | Next-generation Expert and LA product launches | Possible use of RORZE robotics; throughput improvements |
| 2,027 | SiC/GaN fab investment cycle | Orders for laser ablation systems |
| Ongoing | Export-control rules on equipment shipments to China | Effect on the overseas sales mix |
Jan 2027: Catalyst: RORZE Q3 results (FY ending Feb 2027); What to watch: Progress against the JPY 180.0 billion sales guidance; commentary on analytical equipment
Apr 2027: Catalyst: RORZE full-year results and FY ending Feb 2028 guidance; What to watch: Growth outlook; any segment detail on analytical equipment
May 2027: Catalyst: RORZE annual securities report; What to watch: Subsidiary data; goodwill on the IAS acquisition
2027: Catalyst: Next-generation Expert and LA product launches; What to watch: Possible use of RORZE robotics; throughput improvements
2027: Catalyst: SiC/GaN fab investment cycle; What to watch: Orders for laser ablation systems
Ongoing: Catalyst: Export-control rules on equipment shipments to China; What to watch: Effect on the overseas sales mix
Analyst verdict
RORZE IAS is a textbook global-niche Japanese equipment specialist: small, profitable and technically differentiated, in a part of the semiconductor value chain where getting it wrong is very costly. Metallic contamination measured in atoms per square centimeter can wipe out the yield of an advanced-node wafer worth tens of thousands of dollars. The Expert VPD platform has more than 100 production installations, and it has been validated with both Agilent's and PerkinElmer's flagship ICP-MS systems. Together these give RORZE IAS a defensible installed base, where switching costs are driven by fab qualification rather than price.
The disclosed numbers support that view. Sales more than doubled between FY2019 and the FY2025 profile. FY2021 operating margin passed 20%, and the company has been profitable every year since 2004. RORZE paid about JPY 5.7 billion for 100%, roughly 12 times FY2021 earnings, which looks disciplined next to the parent's own multiple. Since then, headcount has grown from 42 to 70, and the European channel and brand have been folded into the group. Both signs point to RORZE treating the business as a growth platform, not an add-on.
The strategic case rests on two expansions. The first moves beyond silicon-wafer VPD to wide-bandgap substrates and nanoparticle analysis through femtosecond laser ablation. The second moves beyond wafers to chemicals and gases through CSI, ASAS II, ASDM and GED. Both target areas where contamination control is getting harder and where established competitors such as PVA TePla and Rigaku have less to offer.
The risks are real but manageable. Capex cyclicality, heavy overseas exposure and dependence on third-party ICP-MS detectors will cause volatility. Competition is now about throughput, not just sensitivity. For RORZE shareholders, RORZE IAS is too small to move consolidated results. Its value is strategic: it is a high-margin, IP-rich metrology foothold that complements RORZE's wafer-handling business. As long as AI-driven fab investment and power-semiconductor growth continue, the outlook for RORZE IAS is favorable. The main risk is that limited disclosure keeps that progress hard to see from outside.
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View Subscription PlansExecutive Leadership
Board of Directors
| Name | Title | Tenure | Background |
|---|---|---|---|
Katsuhiko (Katsu) Kawabata | Chairman & Representative Director | Founder, 2004 to present (President until the leadership change after the rename; Chairman since then) | Founded IAS in 2004 and developed its ICP-MS-integrated products for wafers, chemicals and gases. Co-author of Agilent and PerkinElmer application notes. Speaker for PerkinElmer and SEMI on metallic contamination control. Also listed by SEMI as Chairman of RORZE Automation Inc. (the US group subsidiary). Before 2004: not publicly disclosed |
Katsushi Hayasaki | President & Representative Director | Current | — |
Non-executive director nominated by RORZE | Director | Since March 2023 | Placed by the parent at closing |
Statutory auditor nominated by RORZE | Auditor | Since March 2023 | Placed by the parent at closing |
“—” = not publicly disclosed.
Major Shareholders
| Holder | Shares | Stake | Basis |
|---|---|---|---|
RORZE CORPORATION | 1,784 | 100% | Share acquisition (1 March 2023) and share exchange (2 March 2023), per RORZE disclosure of 6 January 2023 |
Competitive Landscape
Key Competitors
| Competitor | Country | Overlapping offering | Relative positioning |
|---|---|---|---|
PVA TePla AG | Germany | WSPS wafer surface preparation and WSMS (including the WSMS Integra HT inline system) VPD platforms, from the former Munich Metrology | Main global rival in automated VPD; markets double throughput and fab-ready SECS/GEM integration; strong in Europe |
NAS Giken | Japan | VPD equipment | Domestic Japanese rival in wafer VPD pretreatment |
Elemental Scientific (ESI) | USA | Automated sample introduction, VPD-ICP-MS and online chemical monitoring | Strong in ICP-MS autosampling and chemical analysis; competes with ASAS, ASDM and CSI |
Rigaku | Japan | VPD-TXRF and TXRF wafer-contamination metrology | Competing method; detection limits typically 1E+08–1E+10 atoms/cm² versus 1E+05–1E+07 for VPD-ICP-MS/MS |
Korea Techno | South Korea | VPD equipment | Local supplier to Korean memory fabs |
VPD Integration Service LLC (VISL) | USA | VPD systems and integration | Smaller integrator |
Thermo Fisher Scientific | USA | ICP-MS and listed VPD offerings | Instrument maker that partly overlaps with VPD integration |
Agilent Technologies | USA | ICP-QQQ detectors | Partner and complement; offers compatibility with all leading VPD systems |
PerkinElmer | USA | NexION ICP-MS | Partner and complement |
Shimadzu | Japan | ICP-MS instruments | Adjacent instrument maker |
Peer Comparison FY2026
| Attribute | RORZE IAS | PVA TePla (VPD) | Elemental Scientific | Rigaku (TXRF) |
|---|---|---|---|---|
Core method | VPD-ICP-MS, LA-ICP-MS, online chemicals and gases | VPD-ICP-MS (WSPS/WSMS) | Sample introduction, VPD, chemical monitoring | TXRF, VPD-TXRF |
Non-Si wafer (SiC/GaN) direct analysis | Yes (LA-GED-MSAG) | Not a core VPD capability | Not a core capability | Yes (surface TXRF) |
Chemical and gas monitoring | Yes (CSI, ASAS II, ASDM, GED) | No | Yes | No |
Ownership | RORZE CORPORATION (TSE 6323) | Listed (Frankfurt) | Private | Listed (TSE) |
Recent Developments
Company-specific news for an unlisted subsidiary is limited, so parent-level events that directly affect RORZE IAS's resources, ownership or operating environment are included.
